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Filters: Author is Weiqiang Xie [Clear All Filters]

2014

S. Selvarajaa et al., “193nm immersion lithography for high-performance silicon photonic circuits”, Spie Advanced Lithography, vol. 9052. SPIE , United states, pp. 9052-14, 2014.

W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., “High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,”, Journal of Lightwave Technology, vol. 32, no. 18, pp. 1457 - 1462 , 2014.