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2011

S. Selvarajaa, L. Rosseel, F. E., Tabat, M., Bogaerts, W., Hautala, J., and Absil, P., “SOI Thickness Uniformity Improvement using Corrective Etching for Silicon Nano-Photonic Device”, in 8th International Conference on Group IV Photonics, United Kingdom, 2011, pp. 71-73.

S. Selvarajaa, L. Rosseel, F. E., Tabat, M., Bogaerts, W., Hautala, J., and Absil, P., “SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device”, in 16th Annual Symposium of the IEEE Photonics Benelux Chapter, Belgium, 2011, pp. 289-292.