High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography

W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., “High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography”, in Proceedings of the 2012 Annual Symposium of the IEEE Photonics Society Benelux Chapter, Belgium, 2012, pp. 183-186.